J. Lillé

E-beam writing: a next-generation lithography approach for thin-film head critical features

R.E. Fontana, J. A. Katine, Mike Rooks et al. · IEEE Transactions on Magnetics · 2002 · 46 citations

Natural Sciences, Manufacturing Engineering, Materials Science +12

Head challenges for perpendicular recording at high areal density

C. Tsang, C. Bonhôte, Qing Dai et al. · IEEE Transactions on Magnetics · 2006 · 39 citations

Engineering, Computer Engineering, Electrical Engineering +9

Current-limiting amplifier for high speed measurement of resistive switching data

Tyler Hennen, E. Wichmann, Antonio Elías et al. · Review of Scientific Instruments · 2021 · 22 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Line-frequency doubling of directed self-assembly patterns for single-digit bit pattern media lithography

Kanaiyalal C. Patel, Ricardo Ruiz, J. Lillé et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 13 citations

Natural Sciences, Materials Engineering, Materials Science +15

Prevention of dewetting during annealing of FePt films for bit patterned media applications

Andrew McCallum, Dan Kercher, J. Lillé et al. · Applied Physics Letters · 2012 · 13 citations

Natural Sciences, Materials Engineering, Materials Science +17