Chang Ho Woo

Influence of active layer thickness and annealing in zinc oxide TFT grown by atomic layer deposition

Cheol Hyoun Ahn, Chang Ho Woo, Sooyeon Hwang et al. · Surface and Interface Analysis · 2010 · 22 citations

Engineering, Channel Thickness, Thin Film Process Technology +19

Influence of the thermal annealing temperature of the channel layers grown at room temperature on the device performance in the ZnO thin-film-transistors

Cheol Hyoun Ahn, Dong Kyu Seo, Chang Ho Woo et al. · Physica B Condensed Matter · 2009 · 19 citations

Materials Science, Room Temperature, Electrical Engineering +7

Role of the crystallinity of ZnO films in the electrical properties of bottom-gate thin film transistors

Ju Ho Lee, Cheol Hyoun Ahn, Sooyeon Hwang et al. · Thin Solid Films · 2011 · 15 citations

Materials Science, Electrical Engineering, Engineering +6

Transparent and flexible oxide thin-film-transistors using an aluminum oxide gate insulator grown at low temperature by atomic layer deposition

Chang Ho Woo, Cheol Hyoun Ahn, Yong Hun Kwon et al. · Metals and Materials International · 2012 · 12 citations

Materials Science, Electrical Engineering, Semiconductor Device +9