Development of New a-Si/c-Si Heterojunction Solar Cells: ACJ-HIT (Artificially Constructed Junction-Heterojunction with Intrinsic Thin-Layer)

Makoto Tanaka, Mikio Taguchi, Takao Matsuyama, +5

Japanese Journal of Applied Physics

EngineeringIntrinsic Thin-layerConversion EfficiencySemiconductor MaterialsPhotovoltaic Devices +16

Interference-Free Determination of the Optical Absorption Coefficient and the Optical Gap of Amorphous Silicon Thin Films

Yoshihiro Hishikawa, Noboru Nakamura, Shinya Tsuda, +3

Japanese Journal of Applied Physics

Optical MaterialsEngineeringInterference-free DeterminationOptoelectronic DevicesThin Film Process Technology +20

Enlargement of Poly-Si Film Grain Size by Excimer Laser Annealing and Its Application to High-Performance Poly-Si Thin Film Transistor

Hiroyuki Kuriyama, Seiichi Kiyama, Shigeru Noguchi, +10

Japanese Journal of Applied Physics

Optical MaterialsEngineeringLaser ApplicationsIntegrated CircuitsSilicon On Insulator +14

Dielectric Characteristics of (A_1/2 ¹⁺·A_1/2 ³⁺)TiO₃ Ceramics at Microwave Frequencies

Hisakazu Takahashi, Yoko Baba, Kenichi Ezaki, +4

Japanese Journal of Applied Physics

Materials ScienceDielectricsDielectric ConstantEngineeringTio 3 +10

Preparation of c-Axis Oriented AlN Thin Films by Low-Temperature Reactive Sputtering

Hiroshi Okano, Yusuke Takahashi, Toshiharu Tanaka, +2

Japanese Journal of Applied Physics

Aluminium NitrideEngineeringAcoustic MetamaterialChemical DepositionAluminum Nitride +16

Preparation of aluminum nitride thin films by reactive sputtering and their applications to GHz-band surface acoustic wave devices

Hiroshi Okano, Naoki Tanaka, Yusuke Takahashi, +3

Applied Physics Letters

Materials ScienceAluminium NitrideElectrical EngineeringSurface Acoustic WaveEngineering +11

The Influence of the Si-H₂ Bond on the Light-Induced Effect in a-Si Films and a-Si Solar Cells

Noboru Nakamura, Tsuyoshi Takahama, Masao Isomura, +6

Japanese Journal of Applied Physics

EngineeringThermal RecoverySilicon On InsulatorPhotovoltaicsSolar Cell Structures +16

Microwave Dielectric Properties of CaO-Li₂O-Ln₂O₃-TiO₂ Ceramics

Kenichi Ezaki, Yoko Baba, Hisakazu Takahashi, +2

Japanese Journal of Applied Physics

Materials ScienceLi 2EngineeringFunctional CeramicApplied Physics +8

Preparation and Properties of High-Quality a-Si Films with a Super Chamber : Separated Ultra-High Vacuum Reaction Chamber

Shinya Tsuda, Tsuyoshi Takahama, Masao Isomura, +9

Japanese Journal of Applied Physics

EngineeringIntegrated CircuitsVacuum DeviceSilicon On InsulatorPhotovoltaics +15

Lateral Grain Growth of Poly-Si Films with a Specific Orientation by an Excimer Laser Annealing Method

Hiroyuki Kuriyama, Tomoyuki Nohda, Satoshi Ishida, +5

Japanese Journal of Applied Physics

EngineeringThin Film Process TechnologySilicon On InsulatorPoly-si FilmsEpitaxial Growth +16