D. O. Klenov - Concepedia

Concepedia

Author

D. O. Klenov

University of California, Santa Barbara

Also Known As

D Klenov, D O Klenov, D. Klenov, D. O. Klenov, D.O Klenov, D.O. Klenov, DO Klenov

27

Publications

2.2K

Citations

11

H-Index

46

Concepts

All Affiliations

University of California, Santa Barbara The University of Melbourne Boreskov Institute of Catalysis The Ohio State University Thermo Fisher Scientific (Netherlands)

DO

About

D. O. Klenov is an author at University of California, Santa Barbara specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	10	764
2	Applied Physics	7	7	515
3	Natural Sciences	4	4	316
4	Health Sciences	1	1	139
5	Medicine	1	1	38

D. O. Klenov

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13

Publications

2.2K

Citations

11

H-Index

	Year	Citations
Enhanced Gas Sensing by Individual SnO<sub>2</sub> Nanowires and Nanobelts Functionalized with Pd Catalyst Particles Andrei Kolmakov, D. O. Klenov, Yigal Lilach, Nano Letters	2005	1.4K
Atomic-resolution chemical mapping using energy-dispersive x-ray spectroscopy A.J. D’Alfonso, Bert Freitag, D. O. Klenov, Physical Review B X-ray CrystallographyX-ray SpectroscopyEngineeringMicroscopyChemistry	2010	211
Enhanced Detection Sensitivity with a New Windowless XEDS System for AEM Based on Silicon Drift Detector Technology P. Schloßmacher, D. O. Klenov, Bert Freitag, Microscopy Today X-ray SpectroscopyEngineeringMicroscopyAnalytical Electron MicroscopesX-ray Fluorescence	2010	139
Thermoelectric power factor in semiconductors with buried epitaxial semimetallic nanoparticles Joshua M. O. Zide, D. O. Klenov, Susanne Stemmer, Applied Physics Letters EngineeringThermoelectric Power GeneratorsThermoelectricsThermal ConductivitySemimetallic Eras Nanoparticles	2005	137
Contribution of thermally scattered electrons to atomic resolution elemental maps B.D. Forbes, A.J. D’Alfonso, R. E. A. Williams, Physical Review B X-ray SpectroscopyEngineeringPhysicsElectron MicroscopyNatural Sciences	2012	67
Electrical and material characterizations of high-permittivity HfxTi1−xO2 gate insulators M. Li, Z. Zhang, S.A. Campbell, Journal of Applied Physics EngineeringMaterial CharacterizationsThin Film Process TechnologySemiconductor DevicePure Hfo2	2005	52
Nanobeam Diffraction: Technique Evaluation and Strain Measurement on Complementary Metal Oxide Semiconductor Devices Paola Favia, M. Bargallo Gonzales, Eddy Simoen, Journal of The Electrochemical Society EngineeringStrain MeasurementNbd TechniqueSemiconductor DeviceSemiconductor Nanostructures	2011	50
Vacancy ordering in the structure of γ-Al2O3 G. N. Kryukova, D. O. Klenov, S. V. Tsybulya Journal of the European Ceramic Society Materials ScienceTransition Metal ChalcogenidesEngineeringApplied PhysicsCondensed Matter Physics	2000	47
Comparison of the Detection Limits of EDS and EELS in S/TEM HS von Harrach, D. O. Klenov, Bert Freitag, Microscopy and Microanalysis PhysicsMicroscopyMicroscopy MethodAugust 1Detection Limits	2010	38
Intergrowth between V2O5 and TiO2 (anatase): High resolution electron microscopy evidence G. N. Kryukova, D. O. Klenov Reaction Kinetics and Catalysis Letters EngineeringMicroscopyNatural SciencesTitanium Dioxide MaterialsMolecular Biology	1997	28

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