K. ‐M.

Chemical Vapor Deposition of Copper from Hexafluoroacetylacetonato Copper(I) Vinyltrimethylsilane: Deposition Rates, Mechanism, Selectivity, Morphology, and Resistivity as a Function of Temperature and Pressure

Ajay K. Jain, K. ‐M., Toivo T. Kodas et al. · Journal of The Electrochemical Society · 1993 · 109 citations

Natural Sciences, Chemistry, Materials Science +16

Patterned Deposition of Copper on Poly(tetrafluoroethylene)

R. R. Rye, K. ‐M., Mark J. Hampden‐Smith et al. · Journal of The Electrochemical Society · 1992 · 29 citations

Natural Sciences, Materials Engineering, Materials Science +14

Electronic processes in semiconductor materials studied by nanosecond time-resolved microwave conductivity—III. Al2O3, MgO and TiO2 powders

John M. Warman, de Haas Matthijs P., K. ‐M. et al. · International Journal of Radiation Applications and Instrumentation Part C Radiation Physics and Chemistry · 1991 · 10 citations

Natural Sciences, Materials Science, Physics +14