Guangming Yan

Phosphorus diffusion in germanium following implantation and excimer laser annealing

Chen Wang, Li Cheng, Shihao Huang et al. · Applied Surface Science · 2014 · 30 citations

Engineering, Materials Engineering, Materials Science +12

Low Specific Contact Resistivity to n-Ge and Well-Behaved Ge n⁺/p Diode Achieved by Implantation and Excimer Laser Annealing

Chen Wang, Cheng Li, Shihao Huang et al. · Applied Physics Express · 2013 · 17 citations

Engineering, Electrical Engineering, Materials Science +17

Improvement on performance of Si-based Ge PIN photodetector with Al/TaN electrode for n-type Ge contact

Wu Zheng, Wang Chen, Guangming Yan et al. · Acta Physica Sinica · 2012 · 14 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

<i>In situ</i> doped phosphorus diffusion behavior in germanium epilayer on silicon substrate by ultra-high vacuum chemical vapor deposition

Shihao Huang, Cheng Li, Chengzhao Chen et al. · Applied Physics Letters · 2013 · 10 citations · Full text

Engineering, Materials Engineering, Materials Science +17