Concepedia

Xubing Lu

XL

6

Publications

217

Citations

6

H-Index

2003

Active since

Affiliations

Tokyo Institute of Technology(Current)

Fujitsu (Japan)

Xubing Lu is an author at Tokyo Institute of Technology specializing in applied physics, materials science, and engineering.

Top concepts

EngineeringApplied PhysicsMaterial ScienceThin FilmsElectrical EngineeringSemiconductorsMicroelectronicsSurface ScienceMaterials EngineeringNanoelectronics

Publications per year

2003–2022

6

Publications

6

Structure and dielectric properties of amorphous LaAlO3 and LaAlOxNy films as alternative gate dielectric materials

Xubing Lu, Zhiguo Liu, Yiping Wang et al. · Journal of Applied Physics · 2003 · 120 citations

Engineering, Thin Film Process Technology, Lao Films +17

Characterization of HfTaO films for gate oxide and metal-ferroelectric-insulator-silicon device applications

Xubing Lu, Kenji Maruyama, Hiroshi Ishiwara · Journal of Applied Physics · 2008 · 42 citations

Metal-ferroelectric-insulator-silicon Device Applications, Engineering, Thin Film Process Technology +18

Characteristics of metal-ferroelectric-insulator-semiconductor diodes composed of Pt electrodes and epitaxial Sr0.8Bi2.2Ta2O9(001)/SrTiO3(100)/Si(100) structures

Xubing Lu, Hiroshi Ishiwara, Xing Gu et al. · Journal of Applied Physics · 2009 · 19 citations

Materials Science, Semiconductors, Electrical Engineering +14

Low-voltage operation and excellent data retention characteristics of metal-ferroelectric-insulator-Si devices based on organic ferroelectric films

Xubing Lu, Joo-Won Yoon, Hiroshi Ishiwara · Journal of Applied Physics · 2009 · 14 citations

Non-volatile Memory, Engineering, Organic Electronics +17

Metal–ferroelectric–insulator–Si devices using HfTaO buffer layers

Xubing Lu, Kenji Maruyama, Hiroshi Ishiwara · Semiconductor Science and Technology · 2008 · 12 citations

Materials Science, Semiconductor Technology, Electrical Engineering +13

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