Toshimichi Ito Toshimichi Ito

Electron Affinity of Single-Crystalline Chemical-Vapor-Deposited Diamond Studied by Ultraviolet Synchrotron Radiation

Nobuhiro Eimori, Yusuke Mori, Akimitsu Hatta et al. · Japanese Journal of Applied Physics · 1994 · 62 citations

Engineering, Electron Affinity, Solid-state Chemistry +18

Effect of Ambient on the Surface Resistance of Diamond Films during Cooling after Deposition

Yusuke Mori, Nobuhiro Eimori, Akimitsu Hatta et al. · Japanese Journal of Applied Physics · 1992 · 46 citations

Engineering, Vacuum Device, Chemical Deposition +16

Fabrication of Diamond Films at Low Pressure and Low-Temperature by Magneto-Active Microwave Plasma Chemical Vapor Deposition

Takuya Yara, Motokazu Yuasa, Manabu Shimizu et al. · Japanese Journal of Applied Physics · 1994 · 19 citations

Materials Engineering, Materials Science, Plasma Electronics +9

Elastic Recoil Detection Analysis for Hydrogen near the Surface of Chemical-Vapor-Deposited Diamond

Hiromasa Yagi, Kazuo TANIDA, Kazuhito Nishimura et al. · Japanese Journal of Applied Physics · 1995 · 16 citations

Materials Science, Diamond-like Carbon, Engineering +14

Luminescent Characteristics of Plasma-Oxidized Porous Silicon

Osamu Arakaki, Akimitsu Hatta, Toshimichi Ito Toshimichi Ito et al. · Japanese Journal of Applied Physics · 1994 · 13 citations

Materials Science, Sio 2, Photoluminescence +11