Ding Shi-Jin

FTIR Characterization of Fluorine Doped Silicon Dioxide Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition

Wang Peng-fei, Ding Shi-Jin, Wei Zhang et al. · Chinese Physics Letters · 2000 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +15

Characterization of Al ₂ O ₃ Thin Films on GaAs Substrate Grown by Atomic Layer Deposition

Lu Hong-Liang, LI Yan-bo, Min Xu et al. · Chinese Physics Letters · 2006 · 18 citations

Natural Sciences, Materials Engineering, Materials Science +17

Electrical Characterization of Metal–Insulator–Metal Capacitors with Atomic-Layer-Deposited HfO ₂ Dielectrics for Radio Frequency Integrated Circuit Application

Yu-Jian Huang, Ding Shi-Jin, Wei Zhang et al. · Chinese Physics Letters · 2007 · 13 citations

Natural Sciences, Electrical Engineering, Materials Science +17

High density Al₂O₃/TaN-based metal–insulator–metal capacitors in application to radio frequency integrated circuits

Ding Shi-Jin, Yu-Jian Huang, Pan Shao-Hui et al. · Chinese Physics · 2007 · 10 citations

Natural Sciences, Electrical Engineering, Materials Science +17

Effects of hydrogen impurities on performances and electrical reliabilities of indium-gallium-zinc oxide thin film transistors

Ding Shi-Jin · Acta Physica Sinica · 2018 · 10 citations · Full text

Engineering, Electrical Engineering, Materials Science +17