Hyunjung Kim - Concepedia

Author

Hyunjung Kim

Hanyang University ORCID

Also Known As

Honggi Kim, Hyun-Jung Kim, Hyunjung Kim, Jingyu Park

Publications

271

Citations

H-Index

Concepts

All Affiliations

Hanyang University Korea Advanced Institute of Science and Technology

About

Hyunjung Kim is an author at Hanyang University specializing in engineering, applied physics, and thin films.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	140
2	Applied Physics	4	4	59
3	Chemical Engineering	2	2	50
4	Chemistry	2	2	50
5	Business	1	1	31

Hyunjung Kim

Publications

152

Citations

H-Index

Page 1

	Year	Citations
Economics of charging infrastructure for electric vehicles in Korea Hyunjung Kim, Dae-Wook Kim, Man‐Keun Kim Energy Policy EconomicsEngineeringElectric VehiclesEnergy ManagementEnergy Policy	2022	31
Electrosorption of cadmium ions in aqueous solutions using a copper-gallate metal-organic framework Yong Hwan Kim, Hyunjung Kim, Kwiyong Kim, Chemosphere Chemical EngineeringEngineeringOrganic ElectrochemistrySurface ElectrochemistryWater Purification	2021	28
Reversible electro-mediated cesium ion removal using a zeolitic imidazolate framework derived zinc hexacyanoferrate composite Hyunjung Kim, Ho Hyeon Eom, Yonghwan Kim, Chemical Engineering Journal Chemical EngineeringEngineeringZinc Hexacyanoferrate CompositeIon ExchangeChemistry	2022	22
Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer Woochool Jang, Hyunjung Kim, Youngkyun Kweon, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringN2 PlasmaThin Film Process TechnologySilicon On InsulatorTrimethylsilyl Amine	2018	17
Leakage current suppression in spatially controlled Si-doped ZrO2 for capacitors using atomic layer deposition Kunyoung Lee, Woochool Jang, Hyunjung Kim, Thin Solid Films Electrical EngineeringEngineeringNanoelectronicsSi-doped Zro2Oxide Electronics	2018	17
Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition Hwanwoo Kim, Hyoseok Song, Changhee Shin, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringThin Film Process TechnologyChemical DepositionSilicon On InsulatorSemiconductors	2016	14
Flow based 3G/WLAN vertical handover scheme using MIH model Hyun-Dong Chu, Hyunjung Kim, Seung‐Joon Seok Media Independent Handover5G SystemVertical HandoverAccess NetworkVertical Handover Scheme	2013	12
Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier Hyunjung Kim, Jingyu Park, Heeyoung Jeon, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceSemiconductorsWnxcy FilmsDiffusion Barrier CharacteristicsEngineering	2015	11

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