Lei Liu

Photo-assisted etching of silicon in chlorine- and bromine-containing plasmas

Weiye Zhu, Shyam Sridhar, Lei Liu et al. · Journal of Applied Physics · 2014 · 30 citations

Materials Science, Chemical Engineering, Optical Materials +15

A comparison among optical emission spectroscopic methods of determining electron temperature in low pressure argon plasmas

Niu Tianye, Jinxiang Cao, Lei Liu et al. · Chinese Physics · 2007 · 29 citations

Engineering, Glow Discharge, Plasma Science +20

External control of electron energy distributions in a dual tandem inductively coupled plasma

Lei Liu, Shyam Sridhar, Weiye Zhu et al. · Journal of Applied Physics · 2015 · 16 citations · Full text

Electrical Engineering, Dual Icp Sources, Engineering +12

Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy

Shyam Sridhar, Lei Liu, Emilia W. Hirsch et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 16 citations

Electrical Engineering, Optical Materials, Photo-assisted Etching +14

Ignition delay of a pulsed inductively coupled plasma (ICP) in tandem with an auxiliary ICP

Lei Liu, Shyam Sridhar, Vincent M. Donnelly et al. · Journal of Physics D Applied Physics · 2015 · 11 citations

Electrical Engineering, Engineering, Plasma Ignition Delay +10