Concepedia

Masihhur R. Laskar

MR

Statistics

Publications

12

Citations

859

H-Index

10

Active since

2008

Affiliations

Tata Institute of Fundamental Research(Current)

The Ohio State University

Raja Ramanna Centre for Advanced Technology

University of Wisconsin–Madison

Dow Chemical (United States)

Masihhur R. Laskar is an author at Tata Institute of Fundamental Research specializing in engineering, applied physics, and materials science.

ORCID

Top concepts

Publications per year

2008–2017

12

Publications

12

p-type doping of MoS<sub>2</sub> thin films using Nb

Masihhur R. Laskar, Digbijoy N. Nath, Lu Ma et al. · Applied Physics Letters · 2014 · 306 citations

, , +15

Large area single crystal (0001) oriented MoS2

Masihhur R. Laskar, Lu Ma, Santhakumar Kannappan et al. · Applied Physics Letters · 2013 · 213 citations · Full text

Atomic Layer Deposited MgO: A Lower Overpotential Coating for Li[Ni<sub>0.5</sub>Mn<sub>0.3</sub>Co<sub>0.2</sub>]O<sub>2</sub> Cathode

Masihhur R. Laskar, David H. K. Jackson, Shenzhen Xu et al. · ACS Applied Materials & Interfaces · 2017 · 129 citations

Atomic Layer Deposition of Al<sub>2</sub>O<sub>3</sub>–Ga<sub>2</sub>O<sub>3</sub> Alloy Coatings for Li[Ni<sub>0.5</sub>Mn<sub>0.3</sub>Co<sub>0.2</sub>]O<sub>2</sub> Cathode to Improve Rate Performance in Li-Ion Battery

Masihhur R. Laskar, David H. K. Jackson, Yingxin Guan et al. · ACS Applied Materials & Interfaces · 2016 · 60 citations

Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes

David H. K. Jackson, Masihhur R. Laskar, Shuyu Fang et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 42 citations

, , +19

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