H. Kheyrandish - Concepedia

Author

H. Kheyrandish

University of Salford

Also Known As

H Kheyrandish, H. Kheyrandish, Hamid Kheyrandish

Publications

639

Citations

H-Index

Concepts

All Affiliations

University of Salford University of Strathclyde Centre National de la Recherche Scientifique Roche (France)Daimler (Germany)

About

H. Kheyrandish is an author at University of Salford specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	14	23	456
2	Applied Physics	14	21	431
3	Natural Sciences	2	2	45
4	Chemical Engineering	2	2	36
5	Chemistry	2	2	31

H. Kheyrandish

Publications

456

Citations

H-Index

Page 1

	Year	Citations
Laser removal of oxides from a copper substrate using Q-switched Nd:YAG radiation at 1064 nm, 532 nm and 266 nm A. Kearns, Christopher Fischer, K. G. Watkins, Applied Surface Science Materials ScienceAdvanced Laser ProcessingEngineeringLaser RemovalOptical Properties	1998	64
Passivation thresholds in iron-chromium alloys prepared by ion-beam sputtering Shinji Fujimoto, Roger Newman, Gordon S. Smith, Corrosion Science Materials ScienceMaterials EngineeringIon ImplantationEngineeringCorrosion	1993	40
The low-temperature variation of the elastic constants of lithium hydride and lithium deuteride B W James, H. Kheyrandish Journal of Physics C Solid State Physics Single CrystalsMineral PhysicEngineeringMechanical EngineeringLithium Hydride	1982	33
Composition and chemical state of titanium nitride films obtained by different methods J.S. Colligon, H. Kheyrandish, L. N. Lesnevsky, Surface and Coatings Technology Materials EngineeringMaterials ScienceChemical EngineeringEngineeringCorrosion	1994	25
Effect of deposition parameters on the microstructure of ion beam assisted deposition TiN films H. Kheyrandish, J.S. Colligon, J. K. Kim Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringMicroscopyChemical DepositionGrain SizeIon Implantation	1994	23
A comparison of TiN films produced by reactive d.c. sputtering and ion-assisted deposition A.V. Bieli, H. Kheyrandish, J.S. Colligon Thin Solid Films Materials EngineeringMaterials ScienceTin FilmsEngineeringCorrosion	1991	22
Highly conductive Sb-doped layers in strained Si Nick S. Bennett, N. E. B. Cowern, Andrew J. Smith, Applied Physics Letters SemiconductorsMaterials ScienceElectrical EngineeringTensile StrainEngineering	2006	19
InAlSb/InAs/AlGaSb Quantum Well Heterostructures for High-Electron-Mobility Transistors B. R. Bennett, J.B. Boos, Mario G. Ancona, Journal of Electronic Materials Wide-bandgap SemiconductorElectrical EngineeringEngineeringApplied PhysicsHigh-electron-mobility Transistors	2007	19
Microstructure of Zirconia Films Prepared by Argon Ion Beam Enhanced Deposition N. K. Huang, H. Kheyrandish, J.S. Colligon physica status solidi (a) EngineeringThin Film Process TechnologyChemistryChemical DepositionPulsed Laser Deposition	1992	19
Advanced activation trends for boron and arsenic by combinations of single, multiple flash anneals and spike rapid thermal annealing W. Lerch, S. Paul, S. McCoy, Materials Science and Engineering B Materials ScienceBoron NitrideEngineeringHexagonal Boron NitrideNanotechnology	2008	18

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