Characterization of the effluent of a He/O₂microscale atmospheric pressure plasma jet by quantitative molecular beam mass spectrometry

Dirk Ellerweg, Jan Benedikt, Achim von Keudell, +2

New Journal of Physics

EngineeringAtmospheric PhotochemistryAbsorption SpectroscopyAtomic Oxygen DensityPlasma Physics +18

Quadrupole mass spectrometry of reactive plasmas

Jan Benedikt, Ante Hećimović, Dirk Ellerweg, +1

Journal of Physics D Applied Physics

Chemical EngineeringEngineeringReactive PlasmasAnalytical InstrumentationNatural Sciences +10

Unexpected O and O₃production in the effluent of He/O₂microplasma jets emanating into ambient air

Dirk Ellerweg, Achim von Keudell, Jan Benedikt

Plasma Sources Science and Technology

Cold Atmospheric PlasmaChemical EngineeringEngineeringAerosol FormationAerobiology +13

Mass spectrometry of atmospheric pressure plasmas

Simon Große‐Kreul, S Simon Hübner, Simon Schneider, +4

Plasma Sources Science and Technology

EngineeringAnalytical InstrumentationPhysicsAtmospheric ScienceSpectroscopy +11

The Role of VUV Radiation in the Inactivation of Bacteria with an Atmospheric Pressure Plasma Jet

Simon Schneider, Jan‐Wilm Lackmann, Dirk Ellerweg, +4

Plasma Processes and Polymers

Vuv RadiationCold Atmospheric PlasmaAnaerobic CulturingPhotochemistryGas Phase +13

The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure

Rüdiger Reuter, Katja Rügner, Dirk Ellerweg, +3

Plasma Processes and Polymers

Materials ScienceEngineeringPlanar ElectrodesGrowth RateSurface Reactions +13

Insight into the Reaction Scheme of Si<scp>O</scp>₂ Film Deposition at Atmospheric Pressure

Katja Rügner, Rüdiger Reuter, Dirk Ellerweg, +3

Plasma Processes and Polymers

EngineeringAtmospheric PressureThin Film Process TechnologyChemistryChemical Deposition +15

Molecular beam sampling system with very high beam-to-background ratio: The rotating skimmer concept

Jan Benedikt, Dirk Ellerweg, Achim von Keudell

Review of Scientific Instruments

EngineeringElectron-beam LithographyMicroscopyHigh Beam-to-background RatioHigh Pressure Region +18

Surface reactions as carbon removal mechanism in deposition of silicon dioxide films at atmospheric pressure

Rüdiger Reuter, Dirk Ellerweg, Achim von Keudell, +1

Applied Physics Letters

EngineeringThin SioxcyhzAtmospheric PressureSilicon Dioxide FilmsPlasma Combustion +18

Mass spectrometry of positive ions and neutral species in the effluent of an atmospheric pressure plasma with hexamethyldisiloxane and oxygen

Jan Benedikt, Dirk Ellerweg, Sebastian Schneider, +4

Journal of Physics D Applied Physics

Neutral SpeciesOptical MaterialsEngineeringChemistrySpectrochemical Analysis +21