Statistics
Publications
116
Citations
3.7K
H-Index
33
Active since
1989
Do Young Noh is an author at Gwangju Institute of Science and Technology specializing in engineering, applied physics, and materials science.
Publications per year
1989–2023
116
116
Control of the π plasmon in a single layer graphene by charge doping
S. Y. Shin, N. D. Kim, J. G. Kim et al. · Applied Physics Letters · 2011 · 90 citations
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