J. Fogelberg

Kinetic modeling of hydrogen adsorption/absorption in thin films on hydrogen-sensitive field-effect devices: Observation of large hydrogen-induced dipoles at the Pd-SiO2 interface

J. Fogelberg, Mats Eriksson, Helen Dannetun et al. · Journal of Applied Physics · 1995 · 155 citations

Engineering, Chemistry, Chemical Engineering +16

Hydrogen adsorption states at the external and internal palladium surfaces of a palladium-silicon dioxide-silicon structure

L.‐G. Petersson, Helen Dannetun, J. Fogelberg et al. · Journal of Applied Physics · 1985 · 85 citations

Engineering, Chemistry, Silicon On Insulator +18

Kinetic modelling of the H2O2 reaction on Pd and of its influence on the hydrogen response of a hydrogen sensitive Pd metal-oxide-semiconductor device

J. Fogelberg, Lars-Gunnar Petersson · Surface Science · 1996 · 74 citations

Oxygen as promoter or poison in the catalytic dissociation of H2, C2H4, C2H2, and NH3 on Palladium

L.‐G. Petersson, H. Dannetun, J. Fogelberg et al. · Applied Surface Science · 1986 · 16 citations

Engineering, Biochemistry, Natural Sciences +7

Ammonia Dissociation on Oxygen Covered Palladium Studied with a Hydrogen Sensitive Pd-MOS Device

J. Fogelberg, I. Lundström, L.‐G. Petersson · Physica Scripta · 1987 · 16 citations

Engineering, Chemistry, Chemical Engineering +20