Concepedia

Author

Jonathan England

Applied Materials (United States)ORCID

Also Known As

England, J., England, Jonathan, J England, J G England, J. England, J. G. England, J.G. England, Jonathan England, Jonathan G. England, Jonathan. England

80

Publications

379

Citations

9

H-Index

41

Concepts

All Affiliations

Applied Materials (United States)University of SurreyApplied Materials (United Kingdom)
JE

About

Jonathan England is an author at Applied Materials (United States) specializing in engineering, applied physics, and microelectronics.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

8

8

174

2

Applied Physics

5

5

96

3

Natural Sciences

1

1

32

4

Biomedical Engineering

1

1

22

5

Computer Engineering

1

1

10

Jonathan England

×

9

Publications

219

Citations

9

H-Index

YearCitations

Electric-field-assisted proton coupling enhanced oxygen evolution reaction

Xuelei Pan, Mengyu Yan, Qian Liu,

Nature Communications

2024

45

The Lamont—Doherty Geological Observatory Isolab 54 isotope ratio mass spectrometer

Jonathan England, Alan Zindler, Laurie Reisberg,

International Journal of Mass Spectrometry and Ion Processes

1992

35

Isotope shifts and hyperfine splitting in<sup>144-154</sup>Sm I

Jonathan England, I. S. Grant, J.A.R. Griffith,

Journal of Physics G Nuclear and Particle Physics

1990

32

The effect of RF plasma power on remote plasma sputtered AZO thin films

B.C. Bussell, P.N. Gibson, J.D. Lawton,

Surface and Coatings Technology

2022

31

Toward Fully Printed Memristive Elements: a-TiO<sub>2</sub> Electronic Synapse from Functionalized Nanoparticle Ink

Barbara Salonikidou, Yasunori Takeda, Brice Le Borgne,

ACS Applied Electronic Materials

2019

22

200 eV–10 keV boron implantation and rapid thermal annealing: Secondary ion mass spectroscopy and transmission electron microscopy study

Michael Current, Dominik Clara Luz Lopes, M.A. Foad,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

1998

19

The Applied Materials xRLEAP ion implanter for ultra shallow junction formation

Jonathan England, Leo F. Joyce, Chris Burgess,

2002

14

The precision implant 9500 plasma flood system — the advanced solution to wafer charging

Hiroyuki Ito, T. Kamata, Jonathan England,

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

1995

11

Application of ion-implantation for improved non-volatile resistive random access memory (ReRAM)

R. G. Elliman, Mohammad Sadeq Saleh, T.-H. Kim,

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

2013

10

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