Yukiko Yamada‐Takamura

Author

Japan Advanced Institute of Science and Technology

Also Known As

Y Yamada-Takamura, Y. >Yamada-Takamura, Y. Yamada-Takamura, Yamada-Takamura, Yukiko, Yukiko Yamada-Takamura, Yukiko Yamada‐Takamura

116

Publications

3.2K

Citations

H-Index

Concepts

All Affiliations

Japan Advanced Institute of Science and Technology The University of Tokyo Chinese Academy of Sciences University of Chinese Academy of Sciences Technical Institute of Physics and Chemistry

About

Yukiko Yamada‐Takamura is an author at Japan Advanced Institute of Science and Technology specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	20	31	2.7K
2	Applied Physics	20	30	2.6K
3	Chemistry	10	11	385
4	Natural Sciences	6	6	276
5	Chemical Engineering	3	3	101

Yukiko Yamada‐Takamura

Publications

Citations

H-Index

Page 1

	Year	Citations
Experimental Evidence for Epitaxial Silicene on Diboride Thin Films Antoine Fleurence, R. Friedlein, Taisuke Ozaki, Physical Review Letters EngineeringOptoelectronic DevicesElectronic PropertiesSemiconductorsGraphene Nanomeshes	2012	1.6K
Experimental Evidence for “Hot Exciton” Thermally Activated Delayed Fluorescence Emitters Jianjun Liu, Zhiyi Li, Taiping Hu, Advanced Optical Materials Delayed FluorescenceEngineeringExcitation Energy TransferChemistryLuminescence Property	2018	90
Unfolding method for first-principles LCAO electronic structure calculations Chi‐Cheng Lee, Yukiko Yamada‐Takamura, Taisuke Ozaki Journal of Physics Condensed Matter EngineeringPhysicsBasis FunctionsNatural SciencesLayered Material	2013	82
Characterization of α-phase aluminum oxide films deposited by filtered vacuum arc Yukiko Yamada‐Takamura, F. Koch, H. Maier, Surface and Coatings Technology Materials ScienceFiltered Vacuum ArcEngineeringOxide ElectronicsSurface Science	2001	75
Progress in the materials science of silicene Yukiko Yamada‐Takamura, R. Friedlein Science and Technology of Advanced Materials	2014	65
Crystal structure characterisation of filtered arc deposited alumina coatings: temperature and bias voltage Robert H. Brill, F. Koch, J. Mazurelle, Surface and Coatings Technology Materials ScienceAluminium NitrideThermal Spray CoatingEngineeringCorrosion	2003	64
Triplet decay-induced negative temperature dependence of the transient photoluminescence decay of thermally activated delayed fluorescence emitter Xiaofang Wei, Yongzhen Chen, Ruihong Duan, Journal of Materials Chemistry C PhotonicsEmission DecayPhotoluminescenceEngineeringPhysics	2017	56
Tuning of silicene-substrate interactions with potassium adsorption R. Friedlein, Antoine Fleurence, Jerzy T. Sadowski, Applied Physics Letters EngineeringChemistrySemiconductor NanostructuresSemiconductorsQuantum Materials	2013	55
Hydrogen permeation barrier performance characterization of vapor deposited amorphous aluminum oxide films using coloration of tungsten oxide Yukiko Yamada‐Takamura, F. Koch, H. Maier, Surface and Coatings Technology Materials ScienceMaterials EngineeringChemical EngineeringAmorphous AluminumEngineering	2002	51
First-principles study on competing phases of silicene: Effect of substrate and strain Chi‐Cheng Lee, Antoine Fleurence, R. Friedlein, Physical Review B Materials ScienceSemiconductorsFree-standing SiliceneSilicene PhasesEngineering	2013	51

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