Jyh-Feng Lin

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Active since

1993

Affiliations

Industrial Technology Research Institute(Current)

Jyh-Feng Lin is an author at Industrial Technology Research Institute specializing in epitaxial growth kinetics, electronic materials, and engineering.

Publications per year

1993–1993

Publications

Metalorganic Vapor Phase Epitaxy Growth and Characterization of (AlxGa1-x)0.5In0.5P/Ga0.5In0.5P (x=0.4, 0.7 and 1.0) Quantum Wells on 15°-Off-(100) GaAs Substrates at High Growth Rate

Ming‐Jiunn Jou, Jyh-Feng Lin, Chuan‐Ming Chang et al. · Japanese Journal of Applied Physics · 1993 · 15 citations

Engineering, Materials Science, Physics +17

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