Ryoichi Nozawa

Substrate bias effects on low temperature polycrystalline silicon formation using electron cyclotron resonance SiH4/H2 plasma

Ryoichi Nozawa, Hirohisa Takeda, Masafumi Ito et al. · Journal of Applied Physics · 1997 · 57 citations

Natural Sciences, Materials Engineering, Materials Science +17

Extraction of Trap States at the Oxide-Silicon Interface and Grain Boundary for Polycrystalline Silicon Thin-Film Transistors

Mutsumi Kimura, Ryoichi Nozawa, Satoshi Inoue et al. · Japanese Journal of Applied Physics · 2001 · 47 citations

Engineering, Electrical Engineering, Materials Science +17

Extraction of trap states in laser-crystallized polycrystalline-silicon thin-film transistors and analysis of degradation by self-heating

Mutsumi Kimura, Satoshi Inoue, Tatsuya Shimoda et al. · Journal of Applied Physics · 2002 · 31 citations

Engineering, Electrical Engineering, Materials Science +17

Synthesis and properties of etherified pullulans

Mitsuhiro Shibata, Ryoichi Nozawa, Naozumi Teramoto et al. · European Polymer Journal · 2002 · 30 citations

Natural Sciences, Chemical Engineering, Chemistry +2

<i>In situ</i> observation of hydrogenated amorphous silicon surfaces in electron cyclotron resonance hydrogen plasma annealing

Ryoichi Nozawa, Hirohisa Takeda, Masafumi Ito et al. · Journal of Applied Physics · 1999 · 25 citations

Natural Sciences, Materials Science, Physics +17