Isamu NAKAAKI

Comparative study of properties between <i>a</i>-GeC:H and <i>a</i>-SiC:H films prepared by radio-frequency reactive sputtering in methane

Nobuo Saito, Tetsuo Yamaguchi, Isamu NAKAAKI · Journal of Applied Physics · 1995 · 46 citations

Engineering, Thin Film Process Technology, Radio-frequency Reactive Sputtering +21

Structural, optical and electronic properties of amorphous SiC: H alloys prepared by magnetron sputtering of silicon in methane-argon gas mixtures

Nobuo Saito, T. Yamada, Tetsuo Yamaguchi et al. · Philosophical Magazine B · 1985 · 44 citations

Optical Materials, Engineering, Optoelectronic Devices +26

Influence of deposition conditions on the properties of a-GeC:H and a-Ge:H films prepared by r.f. magnetron sputtering

Nobuo Saito, Isamu NAKAAKI, T. Yamaguchi et al. · Thin Solid Films · 1995 · 42 citations

Materials Engineering, Magnetism, Materials Science +11

Optical, structural, electrical and optoelectronic properties of hydrogenated amorphous Si1?x C x alloy thin films prepared by planar magnetron sputtering method

Nobuo Saito, Nobutada Tanaka, Isamu NAKAAKI · Applied Physics A · 1985 · 23 citations

Materials Science, Materials Engineering, Planar Magnetron +13

Optical and electrical properties of undoped and oxygen-doped a-GeC:H films prepared by magnetron sputtering

Nobuo Saito, Isamu NAKAAKI, Hiroji Iwata et al. · Thin Solid Films · 2006 · 13 citations

Ii-vi Semiconductor, Electrical Engineering, Optical Materials +12