Th. Welzel - Concepedia

Author

Th. Welzel

Chemnitz University of Technology

Also Known As

T Welzel, T. Welzel, Th Welzel, Th. Welzel

Publications

470

Citations

H-Index

Concepts

All Affiliations

Chemnitz University of Technology Leibniz Institute of Surface Engineering Helmholtz-Zentrum Berlin für Materialien und Energie

About

Th. Welzel is an author at Chemnitz University of Technology specializing in applied physics, engineering, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	17	440
2	Applied Physics	13	15	408
3	Electrical Engineering	10	10	238
4	Natural Sciences	3	3	73
5	Chemistry	3	3	73

Th. Welzel

Publications

455

Citations

H-Index

Page 1

	Year	Citations
Physics and phenomena in pulsed magnetrons: an overview James W. Bradley, Th. Welzel Journal of Physics D Applied Physics MagnetismElectrical EngineeringEngineeringPhysicsMagnetized Plasma Physics	2009	81
Formation of c-BN thin films under reduced ion impact J. Hahn, Frank Richter, R. Pintaske, Surface and Coatings Technology Materials ScienceC-bn Thin FilmsEngineeringApplied PhysicsThin Films	1997	62
Optical properties of nitrogen-rich carbon films deposited by d.c. magnetron sputtering M. Friedrich, Th. Welzel, R. Rochotzki, Diamond and Related Materials Materials ScienceOptical MaterialsEngineeringCarbon-based MaterialOptical Properties	1997	44
Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. I. Negative ions Th. Welzel, S. Naumov, K. Ellmer Journal of Applied Physics EngineeringEnergy SpectraElectronegative Magnetron DischargesMagnetic ResonancePlasma Science	2011	33
Process diagnostics during the deposition of cubic boron nitride R. Pintaske, Th. Welzel, N. Kahl, Surface and Coatings Technology Materials ScienceBoron NitrideEngineeringHexagonal Boron NitrideCubic Boron Nitride	1997	30
AC powered reactive magnetron deposition of indium tin oxide (ITO) films from a metallic target H. Küpfer, Ronny Kleinhempel, Benjamin Graffel, Surface and Coatings Technology Materials EngineeringMaterials ScienceEngineeringMetallic TargetOxide Electronics	2006	24
Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions Th. Welzel, S. Naumov, K. Ellmer Journal of Applied Physics EngineeringGlow DischargeElectronegative Magnetron DischargesPlasma SciencePlasma Physics	2011	21
A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges Th. Welzel, Th. Dunger, H. Küpfer, Journal of Applied Physics Pulsed Magnetron DischargesElectrical EngineeringEngineeringPhysicsDouble Probe	2004	21
Determination of radical densities by optical emission spectroscopy during the ECR plasma deposition of Si-C-N : H films using TMS as a precursor Th. Welzel, Ines Dani, Frank Richter Plasma Sources Science and Technology Optical MaterialsEngineeringOptical Emission SpectroscopyLangmuir ProbesVacuum Device	2002	19
Spectroscopic studies of a magnetron sputtering discharge for boron nitride deposition R. Pintaske, Th. Welzel, N. Kahl, Surface and Coatings Technology Materials ScienceBoron NitrideEngineeringPhysicsHexagonal Boron Nitride	1998	18

Page 1