Concepedia

Kengo Ishiyama

KI

Statistics

Publications

4

Citations

163

H-Index

4

Active since

1992

Affiliations

Toyota Central Research and Development Laboratories (Japan)(Current)

Nagoya University

Toyota Motor Corporation (Switzerland)

Kengo Ishiyama is an author at Toyota Central Research and Development Laboratories (Japan) specializing in surface science, materials science, and natural sciences.

Publications per year

1992–1996

4

Publications

4

Quantitative Measurements of Thermal Relaxation of Isolated Silicon Hillocks and Craters on the Si(111)-(<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mn>7</mml:mn><mml:mo>×</mml:mo><mml:mn>7</mml:mn></mml:math>) Surface by Scanning Tunneling Microscopy

Ayahiko Ichimiya, Yoriko Tanaka, Kengo Ishiyama · Physical Review Letters · 1996 · 86 citations

, , +13

Reactive adsorption and diffusion of Ti on Si(001) by scanning tunneling microscopy

Kengo Ishiyama, Yasunori Taga, Ayahiko Ichimiya · Physical review. B, Condensed matter · 1995 · 32 citations

, , +17

Homo-epitaxial growth on the Si(111) 7 × 7 surface

A. Ichimiya, Tomihiro Hashizume, Kengo Ishiyama et al. · Ultramicroscopy · 1992 · 30 citations

, , +12

Thermal decay of silicon islands and craters on silicon surfaces by scanning tunneling microscopy

Yoriko Tanaka, Kengo Ishiyama, Ayahiko Ichimiya · Surface Science · 1996 · 15 citations

, , +15

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