Thomas Mrozek - Concepedia

Author

Thomas Mrozek

University of Regensburg

Also Known As

T. Mrozek, Thomas Mrozek

Publications

326

Citations

H-Index

Concepts

All Affiliations

University of Regensburg The University of Texas at Austin California Institute of Technology

About

Thomas Mrozek is an author at University of Regensburg specializing in chemistry, photochemistry, and engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	255
2	Chemical Engineering	3	3	146
3	Health Sciences	1	1	37
4	Natural Sciences	1	1	56
5	Biomolecular Engineering	1	1	38

Thomas Mrozek

Publications

292

Citations

H-Index

Page 1

	Year	Citations
Multimode-Photochromism Based on Strongly Coupled Dihydroazulene and Diarylethene Thomas Mrozek, Helmut Görner, Jörg Daub Chemistry - A European Journal Organic Charge-transfer CompoundChemical EngineeringRelaxation KineticsEngineeringPhotochemistry	2001	72
Ultrafast Bidirectional Dihydroazulene/Vinylheptafulvene (DHA/VHF) Molecular Switches: Photochemical Ring Closure of Vinylheptafulvene Proven by a Two-Pulse Experiment Vincent De Waele, Uli Schmidhammer, Thomas Mrozek, Journal of the American Chemical Society Photochromic Couple Dihydroazulene/vinylheptafulveneDha/vhf SystemUltrafast Bidirectional Dihydroazulene/vinylheptafulveneEngineeringPhotochemistry	2002	56
Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results Hoang V. Tran, Raymond Hung, Takashi Chiba, Macromolecules EngineeringElectron-beam LithographyChemistryPolymersChemical Engineering	2002	53
Towards multifold cycloswitching of biphotochromes: investigation on a bond-fused dihydroazulene/vinylheptafulvene and dithienylethene/dihydrothienobenzothiophene Thomas Mrozek, Jörg Daub, Helmut Görner Chemical Communications EngineeringHeterocyclicPhotochemistryMechanistic PhotochemistryCyclic Four-stage Process	1999	38
Dihydroazulene/vinylheptafulvene photochromism: dynamics of the photochemical ring-opening reaction J. Ern, Mary L. Petermann, Thomas Mrozek, Chemical Physics PhotochemistryMechanistic PhotochemistryPhotochemical Ring-opening ReactionPhotocatalysisChemistry	2000	37
Toward Environmentally Friendly Photolithographic Materials: A New Class of Water-Soluble Photoresists Shintaro Yamada, Thomas Mrozek, Timo Rager, Macromolecules Optical MaterialsEngineeringSolubility SwitchesSynthetic PhotochemistryOrganic Chemistry	2003	21
Fluoropolymer Resist Materials for 157nm Microlithography. Hoang V. Tran, Raymond Hung, Takashi Chiba, Journal of Photopolymer Science and Technology Siloxane-based PolymersEngineeringElectron-beam LithographyPolymer NanocompositesChemistry	2001	15

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