Byunguk Kim

Deposition of the tin sulfide thin films using ALD and a vacuum annealing process for tuning the phase transition

Yeonsik Choi, Hyunwoo Park, Namgue Lee et al. · Journal of Alloys and Compounds · 2021 · 28 citations

Materials Science, Engineering, Surface Science +5

Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N2 plasma

Byunguk Kim, Namgue Lee, Junghoon Lee et al. · Applied Surface Science · 2020 · 25 citations

Materials Science, Metal Organic Precursor, Remote Plasma +8

The effect of O2 plasma post-treatment on atomic layer deposited TiO2 thin films

Byunguk Kim, Taeseong Kang, Seokhwi Song et al. · Vacuum · 2022 · 24 citations

Materials Science, Engineering, Oxide Electronics +8

Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)

Byunguk Kim, Namgue Lee, Suhyeon Park et al. · Journal of Alloys and Compounds · 2020 · 18 citations

Materials Science, Chemical Engineering, Metal Organic Precursor +10

Leakage Current Characteristics of Atomic Layer Deposited Al-Doped TiO₂Thin Film for Dielectric in DRAM Capacitor

Byunguk Kim, Yeonsik Choi, Dahyun Lee et al. · ECS Journal of Solid State Science and Technology · 2021 · 18 citations

Materials Science, Leakage Current Characteristics, Electrical Engineering +15