Byungchul Cho

Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al₂O₃ Using Ethanethiol Inhibitor

Hyun Gu Kim, Miso Kim, Bonwook Gu et al. · Chemistry of Materials · 2020 · 87 citations

Natural Sciences, Materials Engineering, Materials Science +17

Selective etching mechanism of silicon oxide against silicon by hydrogen fluoride: a density functional theory study

Romel Hidayat, Hye-Lee Kim, Khabib Khumaini et al. · Physical Chemistry Chemical Physics · 2023 · 21 citations

Engineering, Materials Engineering, Materials Science +17

Etching mechanism of amorphous hydrogenated silicon nitride by hydrogen fluoride

Khabib Khumaini, Yewon Kim, Romel Hidayat et al. · Applied Surface Science · 2024 · 16 citations

Engineering, Materials Engineering, Materials Science +14

Gas-phase etching mechanism of silicon oxide by a mixture of hydrogen fluoride and ammonium fluoride: A density functional theory study

Romel Hidayat, Khabib Khumaini, Hye-Lee Kim et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2023 · 12 citations

Natural Sciences, Materials Engineering, Materials Science +17