Recent Advances in the Research on Non‐Equilibrium Atmospheric Pressure Plasma Jets

J. Laimer, H. Störi

Plasma Processes and Polymers

EngineeringPlasma PhysicsPlasma ElectronicsAtmospheric SciencePlasma Simulation +17

Glow Discharges Observed in Capacitive Radio‐Frequency Atmospheric‐Pressure Plasma Jets

J. Laimer, H. Störi

Plasma Processes and Polymers

EngineeringGlow DischargePlasma SciencePlasma PhysicsRf Power Reduction +15

Plasma-assisted chemical vapor deposition of titanium nitride in a capacitively coupled radio-frequency discharge

J. Laimer, H. Störi, P. Rödhammer

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Materials ScienceElectrical EngineeringHigh Temperature MaterialsEngineeringNew Type +13

Preparation of TiB2 and TiB N coatings by PACVD

H.C. Karner, J. Laimer, Hosen Ri, +1

Surface and Coatings Technology

Investigation of an atmospheric pressure radio-frequency capacitive plasma jet

J. Laimer, S. Haslinger, W. Meissl, +2

Vacuum

Plasma ApplicationApplied Plasma PhysicAerospace Engineering

Study of the ignition behavior of a pulsed dc discharge used for plasma-assisted chemical-vapor deposition

T.A. Beer, J. Laimer, H. Störi

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Ignition BehaviorPulsed Dc DischargeElectrical EngineeringEngineeringGlow Discharge +10

Titanium nitride deposited by plasma-assisted chemical vapour deposition

J. Laimer, H. Störi, P. Rödhammer

Thin Solid Films

Materials ScienceChemical EngineeringEngineeringPlasma-assisted Chemical VapourSurface Science +3

Sputtered thermionic hexaboride coatings

Wolfgang Waldhauser, Christian Mitterer, J. Laimer, +1

Surface and Coatings Technology

Materials ScienceMaterials EngineeringThermal Spray CoatingEngineeringSurface Science +3

Creation of surface nanostructures by irradiation with slow, highly charged ions

A.S. El-Said, W. Meissl, M. C. Simon, +6

Radiation effects and defects in solids

X-ray SpectroscopyEngineeringNanostructured SurfaceNanometric HillocksSurface Nanotechnology +17

On the plasma chemistry of the C/H system relevant to diamond deposition processes

C. G. Schwärzler, O. Schnabl, J. Laimer, +1

Plasma Chemistry and Plasma Processing

Diamond-like CarbonEngineeringDeposition ProcessesNonthermal PlasmaApplied Physics +6