T. Ichimura

Microcrystalline Si: H Film and Its Application to Solar Cells

Yoshiyuki Uchida, T. Ichimura, Masakazu Ueno et al. · Japanese Journal of Applied Physics · 1982 · 60 citations

Optical Materials, Engineering, Optoelectronic Devices +20

The Role of Hydrogen in the Staebler-Wronski Effect of a-Si:H

M. Ohsawa, Toshio Hama, Toshiaki Akasaka et al. · Japanese Journal of Applied Physics · 1985 · 60 citations

Engineering, Chemistry, Silicon On Insulator +18

Characterization of <i>a</i>-Si1−<i>x</i>C<i>x</i>:H/<i>a</i>-Si:H and <i>a</i>-SiN:H/<i>a</i>-Si:H heterojunctions by photothermal deflection spectroscopy

Atsushi Asano, T. Ichimura, Yoshiaki Uchida et al. · Journal of Applied Physics · 1988 · 28 citations

Engineering, H Layer Thickness, Optoelectronic Devices +20

Preparation of highly photoconductive hydrogenated amorphous silicon carbide films with a multiplasma-zone apparatus

Atsushi Asano, T. Ichimura, Hitoshi Sakai · Journal of Applied Physics · 1989 · 22 citations

Engineering, Thin Film Process Technology, Multiplasma-zone Apparatus +19

Amorphous hydrogenated SiC from a low power discharge of SiH4-C2H2 mixture

T. Ichimura, Yoshiyuki Uchida, Katsumi Yamada et al. · Journal of Non-Crystalline Solids · 1983 · 17 citations

Materials Engineering, Materials Science, Electrical Engineering +6