Yu. A. Mankelevich - Concepedia

Author

Yu. A. Mankelevich

Also Known As

Mankelevich, Y., Mankelevich, Yuri, Mankelevich, Yuri A., Y A Mankelevich, Y Mankelevich, Y. A. Mankelevich, Y. Mankelevich, Y.A Mankelevich, Y.A. Mankelevich, YU. A. MANKELEVICH

215

Publications

4.3K

Citations

H-Index

120

Concepts

All Affiliations

Lomonosov Moscow State University University of Bristol IMEC KU Leuven Centre National de la Recherche Scientifique

About

Yu. A. Mankelevich is an author at Lomonosov Moscow State University specializing in engineering, applied physics, and chemistry.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	32	85	3K
2	Applied Physics	30	71	2.7K
3	Chemistry	25	48	1.7K
4	Chemical Engineering	22	39	1.7K
5	Natural Sciences	18	25	932

Yu. A. Mankelevich

121

Publications

4.1K

Citations

H-Index

Page 1

	Year	Citations
Understanding the chemical vapor deposition of diamond: recent progress J. E. Butler, Yu. A. Mankelevich, Andrew Cheesman, Journal of Physics Condensed Matter Materials EngineeringMaterials ScienceChemical EngineeringCvd ReactorsEngineering	2009	236
Microcrystalline, nanocrystalline, and ultrananocrystalline diamond chemical vapor deposition: Experiment and modeling of the factors controlling growth rate, nucleation, and crystal size Paul May, Michael N. R. Ashfold, Yu. A. Mankelevich Journal of Applied Physics EngineeringCrystal Growth TechnologyChemistryChemical DepositionChemical Engineering	2007	131
Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition Jie Ma, Michael N. R. Ashfold, Yu. A. Mankelevich Journal of Applied Physics Optical MaterialsEngineeringAtomic Emission SpectroscopyOptical Emission SpectroscopyAbsorption Spectroscopy	2009	131
From Ultrananocrystalline Diamond to Single Crystal Diamond Growth in Hot Filament and Microwave Plasma-Enhanced CVD Reactors: a Unified Model for Growth Rates and Grain Sizes Paul May, Yu. A. Mankelevich The Journal of Physical Chemistry C	2008	125
Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures Yu. A. Mankelevich, Michael N. R. Ashfold, Jie Ma Journal of Applied Physics Chemical EngineeringPlasma ElectronicsEngineeringOptical DiagnosticsSpectroscopy	2008	115
Reevaluation of the mechanism for ultrananocrystalline diamond deposition from Ar∕CH4∕H2 gas mixtures Paul May, Jeremy N. Harvey, James A. Smith, Journal of Applied Physics Ultrananocrystalline Diamond DepositionEngineeringCrystal Growth TechnologySolid-state ChemistryChemical Deposition	2006	108
New insights into the mechanism of CVD diamond growth: Single crystal diamond in MW PECVD reactors Yu. A. Mankelevich, Paul May Diamond and Related Materials Diamond-like CarbonCvd Diamond GrowthApplied PhysicsMw Pecvd ReactorsSingle Crystal Diamond	2008	93
Unravelling aspects of the gas phase chemistry involved in diamond chemical vapour deposition Michael N. R. Ashfold, Paul May, James R. Petherbridge, Physical Chemistry Chemical Physics	2001	90
On the possibility of O<sub>2</sub>(<i>a</i> <sup>1</sup> <sub>g</sub>) production by a non-self-sustained discharge for oxygen–iodine laser pumping A N Vasiljeva, K. S. Klopovskiy, A. S. Kovalev, Journal of Physics D Applied Physics EngineeringLaser ScienceGlow DischargeLaser-plasma InteractionLaser Applications	2004	87
Deposition of NCD films using hot filament CVD and Ar/CH4/H2 gas mixtures Paul May, James A. Smith, Yu. A. Mankelevich Diamond and Related Materials Materials ScienceMaterials EngineeringChemical EngineeringNcd FilmsEngineering	2005	77

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