D. Jourde

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Active since

2015

Affiliations

Laboratoire d'Électronique des Technologies de l'Information(Current)

Université Grenoble Alpes

Institut polytechnique de Grenoble

Commissariat à l'Énergie Atomique et aux Énergies Alternatives

D. Jourde is an author at Laboratoire d'Électronique des Technologies de l'Information specializing in thin films, chemical vapor deposition, and x-ray photoelectron spectroscopy.

Publications per year

2015–2017

Publications

Impact of In doping on GeTe phase-change materials thin films obtained by means of an innovative plasma enhanced metalorganic chemical vapor deposition process

P. D. Szkutnik, Manuela Aoukar, V. Todorova et al. · Journal of Applied Physics · 2017 · 21 citations

Natural Sciences, Materials Engineering, Materials Science +17

Control of carbon content in amorphous GeTe films deposited by plasma enhanced chemical vapor deposition (PE-MOCVD) for phase-change random access memory applications

Manuela Aoukar, P. D. Szkutnik, D. Jourde et al. · Journal of Physics D Applied Physics · 2015 · 16 citations

Natural Sciences, Materials Engineering, Materials Science +17

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