Concepedia

Richard W. Douse

RW

2

Publications

179

Citations

2

H-Index

1981

Active since

Affiliations

IBM (United States)(Current)

Richard W. Douse is an author at IBM (United States) specializing in applied physics, engineering, and thin films.

Top concepts

Thin FilmsEngineeringApplied PhysicsSurface ScienceMaterial ScienceOptical MaterialsIntegrated CircuitsChemical EngineeringOxide SemiconductorsMaterials Engineering

Publications per year

1981–1985

2

Publications

2

Mechanisms of Plasma‐Enhanced Silicon Nitride Deposition Using SiH4 / N 2 Mixture

Haiping Dun, Paihung Pan, F. White et al. · Journal of The Electrochemical Society · 1981 · 139 citations

Materials Science, Engineering, Surface Science +10

The Composition and Properties of PECVD Silicon Oxide Films

Paihung Pan, L. Nesbit, Richard W. Douse et al. · Journal of The Electrochemical Society · 1985 · 40 citations

Materials Engineering, Materials Science, Chemical Engineering +14

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