Concepedia

Kuniharu Nagashima

KN

Statistics

Publications

6

Citations

252

H-Index

6

Active since

2000

Affiliations

Tokyo Institute of Technology(Current)

Kuniharu Nagashima is an author at Tokyo Institute of Technology specializing in materials engineering, applied physics, and thin films.

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Top concepts

Publications per year

2000–2008

6

Publications

6

Improvement of Property of Pb(Zr<sub>x</sub>Ti<sub>1-x</sub>)O<sub>3</sub> Thin Film Prepared by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition

Kuniharu Nagashima, Masanori Aratani, Hiroshi Funakubo · Japanese Journal of Applied Physics · 2000 · 86 citations

, , +13

Orientation dependence of ferroelectricity of epitaxially grown Pb(ZrxTi1−x)O3 thin films prepared by metalorganic chemical vapor deposition

Kuniharu Nagashima, Masanori Aratani, Hiroshi Funakubo · Journal of Applied Physics · 2001 · 51 citations

, , +17

Composition Control of Pb(Zr<sub>x</sub>Ti<sub>1-x</sub>)O<sub>3</sub> Thin Films Prepared by Metalorganic Chemical Vapor Deposition

Kuniharu Nagashima, Hiroshi Funakubo · Japanese Journal of Applied Physics · 2000 · 51 citations

, , +15

Preparation of Pb(Zr<sub>x</sub>, Ti<sub>1-x</sub>)O<sub>3</sub> Thin Films by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition

Masanori Aratani, Kuniharu Nagashima, Hiroshi Funakubo · Japanese Journal of Applied Physics · 2001 · 37 citations

, , +16

Comparison of deposition behavior of Pb(Zr,Ti)O 3 films and its end-member-oxide films prepared by MOCVD

Hiroshi Funakubo, Kuniharu Nagashima, Kazuo Shinozaki et al. · Thin Solid Films · 2000 · 16 citations

, , +8

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