J. E. Lee

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Active since

2004

Affiliations

J. E. Lee is an author at Sungkyunkwan University specializing in annealing temperature effects, equivalent oxide thickness, and high-temperature oxidation.

Publications per year

2004–2004

Publications

Effects of annealing temperature on the characteristics of HfSixOy/HfO2 high-<i>k</i> gate oxides

H. D. Kim, Yonghan Roh, Y. Lee et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2004 · 15 citations

Natural Sciences, Materials Engineering, Materials Science +17

Characteristics of high-<i>k</i> gate dielectric formed by the oxidation of sputtered Hf/Zr/Hf thin films on the Si substrate

H. D. Kim, Yonghan Roh, J. E. Lee et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2004 · 12 citations

Natural Sciences, Materials Engineering, Materials Science +17

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