Statistics
Publications
5
Citations
116
H-Index
5
Active since
2001
T. Voss is an author at University of Stuttgart specializing in materials science, diffusion in solids, and natural sciences.
Publications per year
2001–2006
5
5
Self-diffusion of 71Ge in Si–Ge
A. Strohm, T. Voss, W. Frank et al. · Physica B Condensed Matter · 2001 · 29 citations
High‐temperature diffusion barriers from Si‐rich silicon‐nitride
G. Bilger, T. Voss, T. Schlenker et al. · Surface and Interface Analysis · 2006 · 18 citations
Self-diffusion of (31)Si and (71)Ge in relaxed Si(0.20)Ge(0.80) layers.
Päivi Laitinen, A. Strohm, J. Huikari et al. · PubMed · 2002 · 10 citations
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