Concepedia

K. H. Olsen

KH

Statistics

Publications

6

Citations

144

H-Index

6

Active since

1961

Affiliations

Honeywell (United States)(Current)

K. H. Olsen is an author at Honeywell (United States) specializing in materials science, engineering, and applied physics.

Top concepts

EngineeringMaterial ScienceApplied PhysicsThin FilmsSurface SciencePhysicsMicrostructureMaterials EngineeringMagnetismNanotechnology

Publications per year

1961–1992

6

Publications

6

Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Films Using Tetraethoxysilane and Oxygen: Characterization and Properties of Films

W. Patrick, G. C. Schwartz, J. Chapple-Sokol et al. · Journal of The Electrochemical Society · 1992 · 62 citations

Moisture Uptake, Engineering, Chip Wiring +18

Studies of a High-Coercivity Electrodeposit Having a Lamellar Structure

J. S. Sallo, K. H. Olsen · Journal of Applied Physics · 1961 · 22 citations

Engineering, Electrode-electrolyte Interface, Magnetic Resonance +19

Substrate-Condensate Chemical Interaction and the Vapor Deposition of Epitaxial Niobium Films

T.E. Hutchinson, K. H. Olsen · Journal of Applied Physics · 1967 · 18 citations

Engineering, Chemical Deposition, Chemical Engineering +18

Formation of hexagonal pyramids and hexagonal flat tops on the surface of heteroepitaxial (0001) CdS films

Mathias Christmann, Keith Jones, K. H. Olsen · Journal of Applied Physics · 1974 · 17 citations

Engineering, Chemistry, Hexagonal Flat Tops +16

Dislocation interactions and dipole formation

Robert J. Stokes, K. H. Olsen · Philosophical magazine · 1963 · 15 citations

Materials Science, Materials Engineering, Dipole Formation +15

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