D. Castillo-Mejia

A Locally Relevant Prestonian Model for Wafer Polishing

D. Castillo-Mejia, Stephen P. Beaudoin · Journal of The Electrochemical Society · 2003 · 60 citations

Engineering, Industrial Engineering, Mechanical Engineering +18

The Effect of Interactions Between Water and Polishing Pads on Chemical Mechanical Polishing Removal Rates

D. Castillo-Mejia, Scott A. Gold, V. A. Burrows et al. · Journal of The Electrochemical Society · 2003 · 40 citations

Engineering, Mechanical Engineering, Polishing Pads +18

Qualitative Prediction of SiO[sub 2] Removal Rates during Chemical Mechanical Polishing

D. Castillo-Mejia, Andreas Perlov, Stephen P. Beaudoin · Journal of The Electrochemical Society · 2000 · 28 citations

Engineering, Industrial Engineering, Mechanical Engineering +23

Polishing Pad Surface Morphology and Chemical Mechanical Planarization

D. Castillo-Mejia, John Kelchner, Stephen P. Beaudoin · Journal of The Electrochemical Society · 2004 · 24 citations

Engineering, Pad Surface Morphology, Mechanical Engineering +17

A Locally Relevant Wafer-Scale Model for CMP of Silicon Dioxide

D. Castillo-Mejia, Stephen P. Beaudoin · Journal of The Electrochemical Society · 2003 · 12 citations

Engineering, Mechanical Engineering, Silicon On Insulator +24