S. D. Park

Effect of N[sub 2]O Plasma Treatment on the Performance of ZnO TFTs

K. Remashan, Dae‐Kue Hwang, S. D. Park et al. · Electrochemical and Solid-State Letters · 2008 · 67 citations

Materials Engineering, Materials Science, Electrical Engineering +10

Atomic Layer Etching of Si(100) and Si(111) Using Cl[sub 2] and Ar Neutral Beam

S. D. Park, D. H. Lee, G.Y. Yeom · Electrochemical and Solid-State Letters · 2005 · 53 citations · Full text

Engineering, Electron-beam Lithography, Atomic Layer Etching +18

Surface Roughness Variation during Si Atomic Layer Etching by Chlorine Adsorption Followed by an Ar Neutral Beam Irradiation

S. D. Park, Chaeyoun Oh, D. H. Lee et al. · Electrochemical and Solid-State Letters · 2005 · 21 citations

Engineering, Integrated Circuits, Silicon On Insulator +17

Highly selective and low damage atomic layer etching of InP∕InAlAs heterostructures for high electron mobility transistor fabrication

S. D. Park, Chaeyoun Oh, W. S. Lim et al. · Applied Physics Letters · 2007 · 17 citations

Materials Science, Materials Engineering, Electrical Engineering +14

Fabrication of InAs composite channel high electron mobility transistors by utilizing Ne-based atomic layer etching

T.-W. Kim, Jong‐In Song, Jae‐Hyung Jang et al. · Applied Physics Letters · 2007 · 14 citations

Materials Science, Materials Engineering, Electrical Engineering +13