Concepedia

Deo Shenai

DS

10

Publications

400

Citations

10

H-Index

2002

Active since

Affiliations

Harvard University(Current)

The University of Texas at Dallas

Dow Chemical (United States)

Deo Shenai is an author at Harvard University specializing in engineering, surface science, and materials science.

Top concepts

EngineeringSurface ScienceMaterial ScienceApplied PhysicsThin FilmsChemistryMaterials EngineeringNanotechnologyMicroelectronicsChemical Engineering

Publications per year

2002–2012

10

Publications

10

A novel thermally-stable zirconium amidinate ALD precursor for ZrO2 thin films

Byoung Guan Lee, Kyu Jeong Choi, A. Hande et al. · Microelectronic Engineering · 2008 · 87 citations

Materials Science, Transition Metal Chalcogenides, Material Analysis +9

Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films

Zhefeng Li, Roy G. Gordon, Venkateswara Pallem et al. · Chemistry of Materials · 2010 · 70 citations

Engineering, Cvd Films, Cubic Boron Nitride +19

Electrical properties of atomic-layer-deposited La2O3 films using a novel La formamidinate precursor and ozone

Byoung Guan Lee, T. J. Park, A. Hande et al. · Microelectronic Engineering · 2009 · 43 citations

Materials Science, Engineering, Oxide Electronics +7

Atomic Layer Deposition of Lanthanum-Based Ternary Oxides

Hongtao Wang, Jun‐Jieh Wang, Roy G. Gordon et al. · Electrochemical and Solid-State Letters · 2009 · 43 citations · Full text

Materials Engineering, Materials Science, Electrical Engineering +14

Vapor Deposition of Highly Conformal Copper Seed Layers for Plating Through-Silicon Vias (TSVs)

Yeung Au, Qing Wang, Huazhi Li et al. · Journal of The Electrochemical Society · 2012 · 35 citations

Materials Engineering, Materials Science, Engineering +14

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