Yoshifumi Nakamine

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Active since

2008

Affiliations

Yoshifumi Nakamine is an author at Tokyo Institute of Technology specializing in materials science, semiconductor materials, and semiconductor device materials.

Publications per year

2008–2013

Publications

Improved visible light driven photoelectrochemical properties of 3C-SiC semiconductor with Pt nanoparticles for hydrogen generation

Jun Tae Song, Hisanori Mashiko, Masayuki Kamiya et al. · Applied Physics Letters · 2013 · 26 citations

Natural Sciences, Materials Engineering, Materials Science +17

Formation Mechanism of 100-nm-Scale Periodic Structures in Silicon Using Magnetic-Field-Assisted Anodization

Daihei Hippo, Yoshifumi Nakamine, Kei Urakawa et al. · Japanese Journal of Applied Physics · 2008 · 21 citations

Engineering, Materials Engineering, Materials Science +13

Size Reduction and Phosphorus Doping of Silicon Nanocrystals Prepared by a Very High Frequency Plasma Deposition System

Yoshifumi Nakamine, Naoki Inaba, Tetsuo Kodera et al. · Japanese Journal of Applied Physics · 2011 · 16 citations

Natural Sciences, Materials Science, Physics +17

Removal of Surface Oxide Layer from Silicon Nanocrystals by Hydrogen Fluoride Vapor Etching

Yoshifumi Nakamine, Tetsuo Kodera, Ken Uchida et al. · Japanese Journal of Applied Physics · 2011 · 11 citations

Engineering, Materials Engineering, Materials Science +17

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