Statistics
Publications
8
Citations
153
H-Index
8
Active since
1990
Ichiharu Kondo is an author at Denso (Japan) specializing in engineering, applied physics, and surface science.
Publications per year
1990–1998
8
8
Adhesion measurement of Ti thin films on Si substrate using internal stress in overcoated Ni films
Ichiharu Kondo, Osamu Takenaka, Toyoharu Kamiya et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 15 citations
Materials Science, Materials Engineering, Surface Characterization +15
Fundamentals of plasma and sputtering processes
Akira KINBARA, Eiji Kusano, Ichiharu Kondo · Vacuum · 1998 · 14 citations
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