Polla Rouf

Atomic layer deposition of InN using trimethylindium and ammonia plasma

Petro Deminskyi, Polla Rouf, Ivan G. Ivanov et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 54 citations · Full text

Engineering, Optoelectronic Devices, Indium Nitride +19

<i>In Situ</i> Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition

Nathan J. O’Brien, Polla Rouf, Rouzbeh Samii et al. · Chemistry of Materials · 2020 · 32 citations · Full text

The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films

Polla Rouf, Nathan J. O’Brien, Karl Rönnby et al. · The Journal of Physical Chemistry C · 2019 · 25 citations · Full text

Engineering, Bidentate Ligands, Optoelectronic Devices +17

Epitaxial GaN using Ga(NMe ₂ ) ₃ and NH ₃ plasma by atomic layer deposition

Polla Rouf, Nathan J. O’Brien, Sydney C. Buttera et al. · Journal of Materials Chemistry C · 2020 · 25 citations · Full text

Hexacoordinated Gallium(III) Triazenide Precursor for Epitaxial Gallium Nitride by Atomic Layer Deposition

Polla Rouf, Rouzbeh Samii, Karl Rönnby et al. · Chemistry of Materials · 2021 · 25 citations · Full text

Wide-bandgap Semiconductor, Engineering, Chemistry +18