Nierlly Karinni de Almeida Maribondo Galvão

Relationships among growth mechanism, structure and morphology of PEALD TiO₂films: the influence of O₂plasma power, precursor chemistry and plasma exposure mode

William Chiappim, G. E. Testoni, Anelise Cristina Osorio César Dória et al. · Nanotechnology · 2016 · 44 citations

Engineering, Thin Film Process Technology, Tio2 Thin Films +18

Influence of the Al₂O₃partial-monolayer number on the crystallization mechanism of TiO₂in ALD TiO₂/Al₂O₃nanolaminates and its impact on the material properties

G. E. Testoni, William Chiappim, Rodrigo Sávio Pessoa et al. · Journal of Physics D Applied Physics · 2016 · 36 citations

Tio2/al2o3 Nanolaminate Structures, Engineering, Thin Film Process Technology +24

OES during reforming of methane by microwave plasma at atmospheric pressure

Clodomiro Alves, Nierlly Karinni de Almeida Maribondo Galvão, Grégory Arnoult et al. · Journal of Analytical Atomic Spectrometry · 2009 · 21 citations

Species H α, Microwave Spectroscopy, Engineering +14

Growth and Characterization of Graphene on Polycrystalline SiC Substrate Using Heating by CO2 Laser Beam

Nierlly Karinni de Almeida Maribondo Galvão, Getúlio de Vasconcelos, Marcos Valentim Ribeiro dos Santos et al. · Materials Research · 2016 · 19 citations · Full text

Materials Science, Materials Engineering, Graphene Nanomeshes +12

The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering

Nierlly Karinni de Almeida Maribondo Galvão, Marciel Guerino, Tiago Moreira Bastos Campos et al. · Micromachines · 2019 · 11 citations · Full text