Takane Usui

Area-Selective Atomic Layer Deposition of Lead Sulfide: Nanoscale Patterning and DFT Simulations

Won‐Young Lee, Neil P. Dasgupta, Orlando Trejo et al. · Langmuir · 2010 · 60 citations

Engineering, Metallic Nanomaterials, Chemistry +19

Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition

Takane Usui, Christine A. Donnelly, Manca Logar et al. · Acta Materialia · 2013 · 51 citations

Materials Science, Engineering, Surface Science +8

Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO₃ Thin Films

Jihwan An, Takane Usui, Manca Logar et al. · ACS Applied Materials & Interfaces · 2014 · 41 citations

Materials Science, Non-volatile Memory, Electrical Engineering +15

Nanoscale Heat Conduction Across Metal-Dielectric Interfaces

Y. Sungtaek Ju, Ming-Tsung Hung, Takane Usui · Journal of Heat Transfer · 2006 · 40 citations

Engineering, Thermal Interface Resistance, Thermal Conductivity +16

Self-limiting atomic layer deposition of barium oxide and barium titanate thin films using a novel pyrrole based precursor

Shinjita Acharya, Jan Torgersen, Yongmin Kim et al. · Journal of Materials Chemistry C · 2015 · 30 citations · Full text

Self-limiting Growth, Engineering, Crystal Growth Technology +18