Paul LaBeaume

Generation of Powerful Tungsten Reductants by Visible Light Excitation

Wesley Sattler, Maraia E. Ener, James D. Blakemore et al. · Journal of the American Chemical Society · 2013 · 94 citations

Lowest Energy Triplet, Visible Light, Engineering +17

Optimization of Polymer-bound PAG (PBP) for 20nm EUV Lithography

James W. Thackeray, Vipul Jain, Suzanne M. Coley et al. · Journal of Photopolymer Science and Technology · 2011 · 28 citations · Full text

Engineering, Electron-beam Lithography, Chemistry +17

Progress in resolution, sensitivity, and critical dimensional uniformity of EUV chemically amplified resists

James W. Thackeray, James F. Cameron, Vipul Jain et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 24 citations

Engineering, Hp Contact Resolution, Electron-beam Lithography +18

Pursuit of Lower Critical Dimensional Uniformity in EUV Resists

James W. Thackeray, James F. Cameron, Vipul Jain et al. · Journal of Photopolymer Science and Technology · 2013 · 19 citations · Full text

Triphenylsulfonium topophotochemistry

Emmanuelle Despagnet‐Ayoub, Wesley W. Kramer, Wesley Sattler et al. · Photochemical & Photobiological Sciences · 2017 · 15 citations