Y. H. Lee

Statistics

Publications

Citations

123

H-Index

Active since

1984

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

Y. H. Lee is an author at IBM Research - Thomas J. Watson Research Center specializing in reactive ion etching, surface science, and materials science.

Publications per year

1984–1985

Publications

Study of silicon contamination and near-surface damage caused by CF4/H2 reactive ion etching

G. S. Oehrlein, R. M. Tromp, Y. H. Lee et al. · Applied Physics Letters · 1984 · 104 citations

Natural Sciences, Materials Engineering, Materials Science +17

Silicon near-surface disorder and etch residues caused by CCIF3/H2 reactive ion etching

G. S. Oehrlein, C. Ransom, S. N. Chakravarti et al. · Applied Physics Letters · 1985 · 19 citations

Engineering, Materials Engineering, Materials Science +17

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