Donna M. Speckman

Alternatives to arsine: The atmospheric pressure organometallic chemical vapor deposition growth of GaAs using triethylarsenic

Donna M. Speckman, J. P. Wendt · Applied Physics Letters · 1987 · 59 citations

Materials Engineering, Materials Science, Chemical Engineering +15

Low temperature pulsed laser deposition of titanium carbide on bearing steels

G. Radhakrishnan, P. M. Adams, Donna M. Speckman · Thin Solid Films · 2000 · 36 citations

Materials Science, Advanced Laser Processing, Engineering +9

Reactions at the metal vertex of a monometal metallacarborane cluster. Chemistry of [closo-3,3-(PPh3)2-3-HSO4-3,1,2-RhC2B9H11] and [closo-3-PPh3-3,3-NO3-3,1,2-RhC2B9H11]

W. C. Kalb, Zenon Demidowicz, Donna M. Speckman et al. · Inorganic Chemistry · 1982 · 36 citations

Materials Science, Inorganic Chemistry, Chemical Engineering +9

A stable 16-electron rhodium(III) rhodacarborane derived from an intermediate containing an agostic hydrogen atom. Molecular structure of closo-3-(.eta.3-C8H13)-1,2-(CH3)2-3,1,2-RhC2B9H9

Donna M. Speckman, Carolyn B. Knobler, M. Frederick Hawthorne · Organometallics · 1985 · 33 citations

Inorganic Chemistry, Donut Icon, Natural Sciences +11

Aromatization of the norbornadiene ligand to an .eta.-ethylcyclopentadienyl ligand in a rhodacarborane via an intermediate which contains an agostic hydrogen atom

Donna M. Speckman, Carolyn B. Knobler, M. Frederick Hawthorne · Organometallics · 1985 · 32 citations

Cross-coupling Reaction, .Eta.-ethylcyclopentadienyl Ligand, Engineering +11