Concepedia

Y. Mikami

YM

Statistics

Publications

2

Citations

40

H-Index

2

Active since

2000

Affiliations

Sanyo (Japan)(Current)

Hiroshima Institute of Technology

Y. Mikami is an author at Sanyo (Japan) specializing in electrical engineering, thin films, and applied physics.

Top concepts

Publications per year

2000–2001

2

Publications

2

Effect of DC bias voltage on the deposition rate for Ni thin films by RF–DC coupled unbalanced-magnetron sputtering

Y. Mikami, Kazuhiko Yamada, Akio OHNARI et al. · Surface and Coatings Technology · 2000 · 21 citations

, , +8

High rate sputtering for Ni films by an rf-dc coupled magnetron sputtering system with multipolar magnetic plasma confinement

Kohei Kawabata, Takeshi Tanaka, A. Kitabatake et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 19 citations

, , +19

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