Concepedia

Toshihiro Yoshimi

TY

4

Publications

171

Citations

4

H-Index

1992

Active since

Affiliations

Mitsubishi Materials (Japan)(Current)

Central Research Institute

Toshihiro Yoshimi is an author at Mitsubishi Materials (Japan) specializing in engineering, materials science, and applied physics.

Top concepts

EngineeringApplied PhysicsMaterial ScienceSurface ScienceMaterials EngineeringMicrostructureMicroelectronicsCrystalline DefectsChemical EngineeringCorrosion

Publications per year

1992–1997

4

Publications

4

Low‐Temperature Out‐Diffusion of Cu from Silicon Wafers

Mohammad Bagher Shabani, Toshihiro Yoshimi, Hidenobu Abe · Journal of The Electrochemical Society · 1996 · 96 citations

Materials Science, Semiconductors, Low Temperature Out‐diffusion +12

Adsorption and Desorption of Metallic Impurities on Si Wafer Surface in SC1 Solution

Jiro Ryuta, Toshihiro Yoshimi, Hideyuki Kondo et al. · Japanese Journal of Applied Physics · 1992 · 33 citations

Engineering, Silicon On Insulator, Metallic Impurities +18

Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence

Hideyuki Kondo, Jiro Ryuta, E. Morita et al. · Japanese Journal of Applied Physics · 1992 · 23 citations

X-ray Spectroscopy, Engineering, Microscopy +22

A Quantitative Method of Metal Impurities Depth Profiling for Gettering Evaluation in Silicon Wafers

Mohammad Bagher Shabani, Toshihiro Yoshimi, S. Okuuchi et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 1997 · 19 citations

Materials Science, Materials Engineering, Silicon Wafers +11

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