G. J. Leusink

The evolution of growth stresses in chemical vapor deposited tungsten films studied by <i>in</i> <i>situ</i> wafer curvature measurements

G. J. Leusink, T. G. M. Oosterlaken, G. C. A. M. Janssen et al. · Journal of Applied Physics · 1993 · 29 citations

Materials Engineering, Materials Science, Engineering +15

Selective chemical vapor deposition of tungsten using WF6 and GeH4

C. A. van der Jeugd, G. J. Leusink, G. C. A. M. Janssen et al. · Applied Physics Letters · 1990 · 28 citations

Materials Engineering, Materials Science, Chemical Engineering +14

Electrical properties of Ti/TiN films prepared by chemical vapor deposition and their applications in submicron structures as contact and barrier materials

Jiumei Hu, Mahmoud Ameen, G. J. Leusink et al. · Thin Solid Films · 1997 · 26 citations

Materials Engineering, Materials Science, Electrical Engineering +11

<i>In</i> <i>situ</i> sensitive measurement of stress in thin films

G. J. Leusink, T. G. M. Oosterlaken, G. C. A. M. Janssen et al. · Review of Scientific Instruments · 1992 · 25 citations

Materials Science, Engineering, Mechanics +14

Growth kinetics and inhibition of growth of chemical vapor deposited thin tungsten films on silicon from tungsten hexafluoride

G. J. Leusink, Chris R. Kleijn, T. G. M. Oosterlaken et al. · Journal of Applied Physics · 1992 · 21 citations

Engineering, Tungsten Hexafluoride, Vacuum Device +17