Gate-all-around Silicon RibbonFET CMOS transistors at gate length $(\mathrm{L}_{\mathrm{G}})$ of 6nm are demonstrated and comprehensively characterized. Single Nanoribbon (1NR) vehicle disconnected from subfin is developed to accurately evaluate “true” short channel effect and performance as a function of $\mathrm{L}_{\mathrm{G}}$ and Silicon thickness $(\mathrm{T}_{\text{si}})$. NR $\mathrm{T}_{\text{si}}$ scaling demonstrated to improve short channel effect without penalty to performance down to 3nm, below which, surface roughness scattering degrades transport. Effective workfunction engineering is performed to reduce threshold voltage at highly scaled gate length and compensate for threshold voltage increase due to quantum confinement at scaled $\mathrm{T}_{\text{si}}$. Injection velocity $(\mathrm{v}_{\mathrm{x}0})=1.13\mathrm{x}10^{7}\text{cm}/\mathrm{s}$ at $\mathrm{L}_{\mathrm{G}}=6\text{nm}$ with no degradation down to $\mathrm{T}_{\text{si}}=3$ nm is demonstrated. These key highlights pave the path for continued gate length scaling which is one of the key foundational cornerstones of Moore's law.

	Year	Citations

About